Covid-19 Impact on High-k and ALD/CVD Metal Precursors Market, Global Research Reports 2020-2021

SKU ID : QYR-15655999 | Publishing Date : 13-May-2020 | No. of pages : 96

An ALD/CVD Metal Precursors are metal precursors used as catalysts and in ALD and CVD applications include metal and ceramic thin and thick films.
The global high-k and ALD/CVD, metal precursors market is poised for a quantum shift over the forecast period as the metal-organic compounds are gaining an edge with low thermal stability properties. Intensive RandD alleviates the need for copper metallization procedures which is expected to drive the deposition of first-row transition-metal films and copper from metal-organic precursors in microelectronics device business. 

This report provides a complete quantitative data and qualitative analysis on the global market for High-k and ALD/CVD Metal Precursors. Market size is analysed by country, product type, application, and competitors. Expanded coverage includes additional end-user industry breakdowns and in-depth producer profiles.
Prior to COVID-19, the global market for High-k and ALD/CVD Metal Precursors was anticipated to grow from US$ XX million in 2020 to US$ XX million by 2026; it is expected to grow at a CAGR of xx% during 2021–2026, whereas post-COVID-19 scenario, the market for High-k and ALD/CVD Metal Precursors is projected to grow from US$ XX million in 2020 (a change by ~XX% compared to market estimated for 2020 before the outbreak of COVID-19) to US$ XX billion by 2026; it is expected to grow at a CAGR of XX% during 2021–2026.
This report covers market size and forecasts of High-k and ALD/CVD Metal Precursors, including the following market information:
Global High-k and ALD/CVD Metal Precursors Market Size, 2019-2021, and 2020 (quarterly data), (US$ Million) & (K MT)
Global High-k and ALD/CVD Metal Precursors Market Size by Type and by Application, 2019-2021, and 2020 (quarterly data), (US$ Million) & (K MT)
Global High-k and ALD/CVD Metal Precursors Market Size by Region (and Key Countries), 2019-2021, and 2020 (quarterly data), (US$ Million) & (K MT)
Global High-k and ALD/CVD Metal Precursors Market Size by Company, 2019- 2020 (quarterly data), (US$ Million) & (K MT)
Key market players
Major competitors identified in this market include Adeka Corporation(Japan), Air Liquide(France), Air Products and Chemicals(US), Colnatec(US), Praxair(US), Dynamic Network Factory Inc(US), DowDuPont, JSR Corporation(Japan), Linde(Germany), NanmatT(China), Union Pacific Chemicals(US), Samsung(Korea), Strem Chemicals Inc(US), Tri Chemical Laboratories Inc(Japan), etc.
Based on the Region:
Asia-Pacific (China, Japan, South Korea, India and ASEAN)
North America (US and Canada)
Europe (Germany, France, UK and Italy)
Rest of World (Latin America, Middle East & Africa)
Based on the Type:
Interconnect
Capacitor/Memory
Gates
Others
Based on the Application:
Semiconductor Industry
Non-Semiconductor Arenas

Frequently Asked Questions

This market study covers the global and regional market with an in-depth analysis of the overall growth prospects in the market. Furthermore, it sheds light on the comprehensive competitive landscape of the global market. The report further offers a dashboard overview of leading companies encompassing their successful marketing strategies, market contribution, recent developments in both historic and present contexts.
  • By product type
  • By End User/Applications
  • By Technology
  • By Region
The report provides a detailed evaluation of the market by highlighting information on different aspects which include drivers, restraints, opportunities, and threats. This information can help stakeholders to make appropriate decisions before investing.
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